Inventor
Keiichi Motoi
Inventor
Tokyo, JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices26%
H04BTransmission11%
B41CProcesses for the manufacture or reproduction of printing surfaces9%
H01PWaveguides9%
H03FAmplifiers9%
B41NPrinting plates or foils6%
H04LTransmission of digital information, e.g. telegraphic communication6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B05DProcesses for applying fluent materials to surfaces, in general3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
PatentTitleYear
10,998,627Phase adjustment circuit and array antenna device202110,629,977Filter circuit and frequency switching method202010,381,701Filter circuit and frequency switching method201910,044,379Transmitter, signal synthesis circuit, and signal synthesis method20189,937,524Method for manufacturing flexographic printing plate and flexographic printing plate20189,793,862'Transmitter and transmission method'20179,319,255'Transmitter, signal-synthesizing circuit, and signal-synthesizing method'20168,991,312'Flexographic printing original plate'20158,850,978'Photosensitive letterpress printing original plate'20148,313,888'Photosensitive flexographic printing original plate'20127,097,957'Photosensitive resin laminate'20067,070,906'Photosensitive resin laminate'20067,026,095'Photosensitive plate'20066,849,383'Photosensitive resin laminate, and signboard plate and signboard made of the laminate'20056,743,569'Photosensitive resin laminate and production method thereof'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2018Patents assigned to TOYO BOSEKI (9)· patent assignee history
2004–2006Based in Ohtsu, JP· patent location history
2012–2018Patents assigned to MOTOI KEIICHI (4)· patent assignee history
2012–2018Patents assigned to YOSHIMOTO KAZUYA (4)· patent assignee history
2012–2015Patents assigned to KAWAKAMI TETSUMA (3)· patent assignee history
2012–2018Based in Okayama, JP· patent location history
2016–2021Patents assigned to NEC CORP (6)· patent assignee history
2016–2021Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOYO BOSEKI | 9 | 2004–2018 |
| NEC CORP | 6 | 2016–2021 |
| MOTOI KEIICHIself | 4 | 2012–2018 |
| YOSHIMOTO KAZUYA | 4 | 2012–2018 |
| KAWAKAMI TETSUMA | 3 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 6 | 2016–2021 |
| Ohtsu, JP | 5 | 2004–2006 |
| Okayama, JP | 4 | 2012–2018 |