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Inventor

Masaki Kurokawa

Inventor
Tokyo, JP

Overview

36→
Patents
2002–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 36 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
H04NPictorial communication, e.g. television9%
B82YSpecific uses or applications of nanostructures8%
H04LTransmission of digital information, e.g. telegraphic communication8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G06FElectric digital data processing7%
C23CCoating metallic material5%
G06KGraphical data reading4%
H01LSemiconductor devices4%
PatentTitleYear
10,991,340Image processing apparatus and image processing method202110,706,246Optical information reading apparatus and optical information reading method202010,573,491Device, manufacturing method, and exposure apparatus202010,419,275Information processing apparatus information processing system, and non-transitory computer readable medium for providing notification to a user of occurrence of a fault201910,256,074Exposure apparatus and exposure method201910,230,870Image processing device and non-transitory computer-readable medium for estimating function to be executed201910,083,813Multicolumn charged particle beam exposure apparatus20189,734,988'Exposure apparatus and exposure method'20179,607,807'Charged particle beam exposure apparatus suitable for drawing on line patterns, and exposure method using the same'20179,569,651'Controller for optical information reader'20179,478,396'Charged particle beam exposure apparatus'20169,425,040'Method of forming laminated film and forming apparatus thereof'20169,343,292'Stacked semiconductor device, and method and apparatus of manufacturing the same'20169,213,240'Electron beam exposure method'20159,213,876'Optical information reader and illumination control method'20159,172,835'Information processing apparatus, information processing system, image forming apparatus, image forming system, and computer readable medium'20159,116,434'Electron beam exposure method'20159,006,115'Silicon oxide film forming method and apparatus'20158,830,499'Information processing apparatus, information processing system, image forming apparatus, image forming system, and computer readable medium'20148,779,378'Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector'20148,659,770'Image forming device, image forming system and computer readable medium with state of security level notification'20148,487,281'Electron beam exposure apparatus and electron beam exposure method'20138,479,277'Information processing apparatus, information processing system, and computer readable medium'20138,384,052'Electron beam lithography apparatus and electron beam lithography method'20138,154,746'Information communication system, sending device, receiving device, recording medium storing transmission control program, recording medium storing reception control program, data signal embodied in carrier wave, sending method, and receiving method'20128,097,314'Fluororesin tube and process for producing the same'20127,979,467'Information processing device, information management device, information processing system and computer readable medium'20117,768,666'Device, device processing history storage system and device processing history storing method'20107,651,749'Fluororesin tube for fixing member for copier and printer'20107,648,895'Vertical CVD apparatus for forming silicon-germanium film'20107,613,412'Device and job history display control method'20097,375,356'Electron-beam exposure system'20087,273,818'Film formation method and apparatus for semiconductor process'20077,164,141'Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device'20076,703,630'Exposure method, electron beam exposure apparatus and fabrication method of electronic device'20046,407,398'Electron beam exposure apparatus and exposure method'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2020Patents assigned to ADVANTEST CORP (12)· patent assignee history
2002–2018Based in Tokyo, JP· patent location history
2007–2016Patents assigned to TOKYO ELECTRON LTD (5)· patent assignee history
2009–2019Patents assigned to FUJI XEROX CO LTD (10)· patent assignee history
2009–2020Based in Saitama, JP· patent location history
2010–2012Based in Konan, JP· patent location history
2012–2014Patents assigned to KUROKAWA MASAKI (7)· patent assignee history
2012–2014Patents assigned to HARADA FUMIO (4)· patent assignee history
2015–2016Based in Nirasaki, JP· patent location history
2019–2021Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADVANTEST CORP122002–2020
FUJI XEROX CO LTD102009–2019
KUROKAWA MASAKIself72012–2014
TOKYO ELECTRON LTD52007–2016
HARADA FUMIO42012–2014
Locations
LocationPatentsSpan
Tokyo, JP142002–2018
Saitama, JP122009–2020
Kanagawa, JP32019–2021
Nirasaki, JP32015–2016
Konan, JP22010–2012