Inventor

Kyeong Keun Choi

Inventor
Kyungki-do, KR

Overview

21→
Patents
1995–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1028%
H10DInorganic electric semiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy4%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution4%
C23CCoating metallic material2%
H10BElectronic memory devices2%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation2%
Y02PClimate change mitigation technologies in the production or processing of goods2%
PatentTitleYear
11,127,965Sheet laminate for solid oxide fuel cell, precursor for solid oxide fuel cell, apparatus for manufacturing sheet laminate for solid oxide fuel cell, and method for manufacturing sheet laminate for solid oxide fuel cell202111,108,060Fuel cell stack structure20217,678,688'Method for forming metal interconnection in image sensor'20106,869,871'Method of forming metal line in semiconductor device including forming first and second zirconium films'20056,815,339'Method for forming copper metal line in semiconductor device'20046,169,327'Metal interconnection structure of semiconductor device'20016,080,594'Method for fabricating a capacitor of a semiconductor device'20005,953,576'Method for fabricating a capacitor of a semiconductor device'19995,837,608'Method of filling a contact hole in a semiconductor device using vertical growth of metal'19985,739,049'Method for fabricating semiconductor device having a capacitor and a method of forming metal wiring on a semiconductor substrate'19985,714,402'Method for fabricating a capacitor of a semiconductor device and the structure of the same'19985,702,970'Method for fabricating a capacitor of a semiconductor device'19975,686,358'Method for forming a plug in a semiconductor device'19975,670,420'Method of forming metal interconnection layer of semiconductor device'19975,637,533'Method for fabricating a diffusion barrier metal layer in a semiconductor device'19975,633,201'Method for forming tungsten plugs in contact holes of a semiconductor device'19975,595,936'Method for forming contacts in semiconductor device'19975,459,100'Method for forming metal wiring of semiconductor device'19955,455,198'Method for fabricating tungsten contact plug'19955,427,981'Process for fabricating metal plus using metal silicide film'19955,380,680'Method for forming a metal contact of a semiconductor device'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2001Patents assigned to HYUNDAI ELECTRONICS IND (16)· patent assignee history
1995–1999Based in Kyungki-do, KR· patent location history
1995–2005Based in Suwon-si, KR· patent location history
1997–1998Based in Ichon, KR· patent location history
1997–2000Based in Ichon-shi, KR· patent location history
2004–2005Patents assigned to HYNIX SEMICONDUCTOR INC (2)· patent assignee history
2010Patents assigned to CHOI KYEONG-KEUN (1)· patent assignee history
2021Patents assigned to LG CHEMICAL LTD (2)· patent assignee history
2021Based in Daejeon, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HYUNDAI ELECTRONICS IND161995–2001
HYNIX SEMICONDUCTOR INC22004–2005
LG CHEMICAL LTD22021
CHOI KYEONG-KEUNself12010
Locations
LocationPatentsSpan
Kyungki-do, KR61995–1999
Suwon-si, KR51995–2005
Ichon, KR31997–1998
Daejeon, KR22021
Ichon-shi, KR21997–2000