Inventor
Dnyanesh Chandrakant Tamboli
Inventor
Gilbert, AZ, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
H01LSemiconductor devices15%
C09KMaterials for miscellaneous applications, not provided for elsewhere14%
C09GPolishing compositions12%
B24BMachines, devices, or processes for grinding or polishing11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
C11DDetergent compositions5%
B28DWorking stone or stone-like materials4%
B82YSpecific uses or applications of nanostructures3%
C01BNon-metallic elements3%
PatentTitleYear
11,111,415Chemical mechanical planarization of films comprising elemental silicon202110,894,906Composite particles, method of refining and use thereof202110,669,449Composite abrasive particles for chemical mechanical planarization composition and method of use thereof202010,421,890Composite particles, method of refining and use thereof201910,418,247Composite abrasive particles for chemical mechanical planarization composition and method of use thereof201910,373,842Composition and method used for chemical mechanical planarization of metals201910,253,216Additives for barrier chemical mechanical planarization201910,109,493Composite abrasive particles for chemical mechanical planarization composition and method of use thereof201810,032,644Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives20189,328,318'Method for wafer dicing and composition useful thereof'20168,883,701'Method for wafer dicing and composition useful thereof'20148,765,653'Formulations and method for post-CMP cleaning'20148,580,656'Process for inhibiting corrosion and removing contaminant from a surface during wafer dicing and composition useful therefor'20137,977,121'Method and composition for restoring dielectric properties of porous dielectric materials'20116,972,083'Electrochemical method and system for monitoring hydrogen peroxide concentration in slurries'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005Based in Orlando, FL, US· patent location history
2011–2019Patents assigned to AIR PROD & CHEM (8)· patent assignee history
2011–2019Based in Breinigsville, PA, US· patent location history
2013–2016Patents assigned to RAO MADHUKAR BHASKARA (4)· patent assignee history
2013–2016Patents assigned to TAMBOLI DNYANESH CHANDRAKANT (4)· patent assignee history
2014–2016Patents assigned to BANERJEE GAUTAM (3)· patent assignee history
2018–2021Patents assigned to VERSUM MAT US LLC (9)· patent assignee history
2018–2021Based in Gilbert, AZ, US· patent location history
2020Based in Tempe, AZ, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| VERSUM MAT US LLC | 9 | 2018–2021 |
| AIR PROD & CHEM | 8 | 2011–2019 |
| RAO MADHUKAR BHASKARA | 4 | 2013–2016 |
| TAMBOLI DNYANESH CHANDRAKANTself | 4 | 2013–2016 |
| BANERJEE GAUTAM | 3 | 2014–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Gilbert, AZ, US | 7 | 2018–2021 |
| Breinigsville, Pennsylvania, US | 6 | 2011–2019 |
| Tempe, AZ, US | 1 | 2020 |
| Orlando, Florida, US | 1 | 2005 |