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Inventor

Tokio Kato

Inventor
Tokyo, JP

Overview

3→
Patents
1998–2002
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material40%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
PatentTitleYear
6,377,655'Reflective mirror for soft x-ray exposure apparatus'20025,815,396'Vacuum processing device and film forming device and method using same'19985,707,500'Vacuum processing equipment, film coating equipment and deposition method'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998Patents assigned to HITACHI LTD (2)· patent assignee history
1998–2002Based in Tokyo, JP· patent location history
2002Patents assigned to NIKON CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD21998
NIKON CORP12002
Locations
LocationPatentsSpan
Tokyo, JP31998–2002