LexDanaLexDanabeta
Inventor

Li-Chi Chao

Inventor
Yangmei Taoyuan, TW

Overview

2→
Patents
2001
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1050%
PatentTitleYear
6,309,962'Film stack and etching sequence for dual damascene'20016,297,168'Edge defect inhibited trench etch plasma etch method'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to TAIWAN SEMICONDUCTOR MFG (2)· patent assignee history
2001Based in Yangmei Taoyuan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG22001
Locations
LocationPatentsSpan
Yangmei Taoyuan, TW22001