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Inventor

HIROKI MAEHARA

Inventor
JP

Overview

4→
Patents
2023–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01LSemiconductor devices15%
H10BElectronic memory devices15%
H10NElectric solid-state devices not otherwise provided for15%
B05CApparatus for applying fluent materials to surfaces, in general8%
C23CCoating metallic material8%
H01JElectric discharge tubes or discharge lamps8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
12,486,575Apparatus for processing substrate, gas shower head, and method for processing substrate202512,400,963Conductive superlattice structures and methods of forming the same202512,336,436Etching method202511,616,194Etching method2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2023–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD42023–2025
Locations
LocationPatentsSpan
JP42023–2025