Inventor

Yixing Lin

Inventor
Saratoga, CA, US

Overview

19→
Patents
2003–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material13%
Y10TTechnical subjects covered by former us classification13%
C22CAlloys11%
C25DProcesses for the electrolytic or electrophoretic production of coatings11%
G06FElectric digital data processing11%
G05BControl or regulating systems in general6%
H04MTelephonic communication6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
B23KSoldering or unsoldering4%
H01JElectric discharge tubes or discharge lamps4%
PatentTitleYear
11,108,901Foldable mobile terminal, foldable mechanism for foldable mobile terminal, and foldable unit for foldable mobile terminal202111,073,868Foldable mobile terminal, foldable mechanism for foldable mobile terminal, and foldable unit for foldable mobile terminal202111,061,443Foldable mechanism for foldable mobile terminal, foldable mechanism assembly for foldable mobile terminal, and foldable mobile terminal202110,583,46530 nm in-line LPC testing and cleaning of semiconductor processing equipment202010,253,406Method for forming yttrium oxide on semiconductor processing equipment201910,233,554Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment20198,021,743'Process chamber component with layered coating and method'20118,010,321'Metrics independent and recipe independent fault classes'20117,910,218'Cleaning and refurbishing chamber components having metal coatings'20117,831,326'Graphical user interface for presenting multivariate fault contributions'20107,765,020'Graphical user interface for presenting multivariate fault contributions'20107,579,067'Process chamber component with layered coating and method'20097,055,732'Semiconductor processing apparatus including plasma-resistant, welded aluminum structures'20067,048,814'Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus'20067,033,447'Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus'20066,776,873'Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers'20046,713,188'Clean aluminum alloy for semiconductor processing equipment'20046,659,331'Plasma-resistant, welded aluminum structures for use in semiconductor apparatus'20036,565,984'Clean aluminum alloy for semiconductor processing equipment'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2020Patents assigned to APPLIED MATERIALS INC (15)· patent assignee history
2003–2020Based in Saratoga, CA, US· patent location history
2010–2011Based in Irvine, CA, US· patent location history
2021Patents assigned to GUANGDONG OPPO MOBILE TELECOMMUNICATIONS CORP LTD (3)· patent assignee history
2021Based in Guangdong, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC152003–2020
GUANGDONG OPPO MOBILE TELECOMMUNICATIONS CORP LTD32021
Locations
LocationPatentsSpan
Saratoga, California, US132003–2020
Guangdong, CN32021
Irvine, California, US32010–2011