Inventor
Michael T. Sheehan
Inventor
Corpus Christi, TX, US
Overview
Patents· 48 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds18%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
C07CAcyclic or carbocyclic compounds15%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C08LCompositions of macromolecular compounds7%
C07DHeterocyclic compounds4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
C08JWorking-up3%
G03CPhotosensitive materials for photographic purposes3%
PatentTitleYear
11,084,848Artificial proteins and compositions and methods thereof20219,815,947'Substantially symmetrical 3-arm star block copolymers'20179,169,383'Preparation, purification and use of high-X diblock copolymers'20158,163,464'Propanoates and processes for preparing the same'20127,897,697'Epoxy resin, blocked polyisocyanate or polymers with polyhydroxystyrenes having novolak structure'20117,728,082'Methods for preparing polymers from phenolic materials and compositions relating thereto'20107,678,945'Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same'20107,662,538'Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same'20107,632,896'Derivatized novolak polyhydroxystyrene'20097,566,752'Epoxy resins or polyisocyanates reacted with derivatized novolak polyhydroxystyrene'20097,534,837'Random copolymers of ethylene and 4-vinylphenyl esters and method for preparing the same'20097,521,526'Methods for preparing polymers from phenolic materials and compositions relating thereto'20097,371,800'Derivatized novolak polyhydroxystyrene from hydroxyphenylmethylcarbinol'20087,312,281'Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity'20077,148,320'Polymer purification'20066,864,324'Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity'20056,787,611'Purification means'20046,759,483'Preparation of homo-, co- and terpolymers of substituted styrenes'20046,593,431'Purification means'20036,414,110'Purification means'20025,773,591'Process for preparing coumarin sulfonates'19985,739,295'Photoactive coumarin sulfonate compounds'19985,726,295'Photoactive coumarin derivatives'19985,726,296'Process for preparing photoactive coumarin derivatives'19985,625,007'Process for making low optical polymers and copolymers for photoresists and optical applications'19975,438,142'Functionalized tris(hydroxyphenyl) compounds'19955,424,387'Di-amino compounds and processes for preparing the same'19955,422,417'Substituted phenyl compounds and processes for preparing the same'19955,399,766'Amines and processes for preparing the same'19955,354,907'Amines derived from THPE and processes for preparing the same'19945,346,983'Substituted phenyl compounds and processes for preparing the same'19945,347,051'Processes for preparing amines'19945,347,049'Processes for preparing diamino compounds'19945,312,990'Di-amino compounds'19945,312,988'Amines derived from THPE'19945,304,610'Amphoteric copolymer derived from vinylpyridine and acetoxystyrene'19945,300,559'Polyamines derived from THPB and processes for preparing the same'19945,300,691'Substituted benzyl amines'19945,300,589'Substituted triphenyl compounds & processes for preparing the same'19945,264,528'Process for the preparation of 4-hydroxystyrene polymers from 4-acetoxystyrene polymers'19935,256,809'Method for preparing a salt of 4-hydroxystyrene and for preparing 4-tertiary-butoxycarbonyloxystyrene therefrom'19935,241,098'Method for preparing a salt of 4-hydroxystyrene and for preparing 4-tertiary-butoxycarbonyloxystyrene therefrom'19935,239,015'Process for making low optical density polymers and copolymers for photoresists and optical applications'19935,232,995'Amphoteric copolymer derived from vinylpyridine and acetoxystyrene'19935,210,149'Amphoteric copolymer derived from vinylpyridine and acetoxystyrene'1993RE034122'Hot melt adhesives containing poly(p-hydroxystyrene) homopolymers and copolymers and bonding methods, employing same'19925,087,772'Method for preparing 4-hydroxystyrene'19924,880,487'Hot melt adhesives containing poly(p-hydroxystyrene) homopolymers and copolymers and bonding methods employing same'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1998Patents assigned to HOECHST CELANESE CORP (27)· patent assignee history
1989–2017Based in Corpus Christi, TX, US· patent location history
2003–2004Patents assigned to CHEMFIRST ELECTRONIC MATERIALS (3)· patent assignee history
2006–2011Patents assigned to DUPONT ELECTRONIC POLYMERS L P (8)· patent assignee history
2009–2017Patents assigned to DU PONT (3)· patent assignee history
2009–2010Patents assigned to PONT ELECTRONIC POLYMERS L P D (2)· patent assignee history
2021Based in Philadelphia, PA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOECHST CELANESE CORP | 27 | 1989–1998 |
| DUPONT ELECTRONIC POLYMERS L P | 8 | 2006–2011 |
| CHEMFIRST ELECTRONIC MATERIALS | 3 | 2003–2004 |
| DU PONT | 3 | 2009–2017 |
| PONT ELECTRONIC POLYMERS L P D | 2 | 2009–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Corpus Christi, Texas, US | 47 | 1989–2017 |
| Philadelphia, Pennsylvania, US | 1 | 2021 |