LexDanaLexDanabeta
Inventor

Daisuke Manba

Inventor
Joetsu-shi, JP

Overview

2→
Patents
2007–2009
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
F01NGas-flow silencers or exhaust apparatus for machines or engines in general25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
PatentTitleYear
7,618,763'Resist composition and patterning process'20097,267,923'Resist composition and patterning process'2007

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2009Patents assigned to SHINETSU CHEMICAL CO (2)· patent assignee history
2007Based in Niigata, JP· patent location history
2009Based in Joetsu-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO22007–2009
Locations
LocationPatentsSpan
Joetsu-shi, JP12009
Niigata, JP12007