Inventor
Yukio Hanamoto
Inventor
Toyonaka, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices44%
G03CPhotosensitive materials for photographic purposes13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
B01DSeparation6%
B05CApparatus for applying fluent materials to surfaces, in general6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
PatentTitleYear
7,264,912'Method of producing photoresist'20077,176,143'Method for evaluating solution for a coating film for semiconductors'20075,368,987'Process for producing resist composition'19945,360,696'Resist composition'19945,290,656'Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound'19945,080,997'Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture'19925,059,507'Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin'1991Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2007Patents assigned to SUMITOMO CHEMICAL CO (7)· patent assignee history
1991–2007Based in Toyonaka, JP· patent location history
1992Based in Osaka, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMITOMO CHEMICAL CO | 7 | 1991–2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyonaka, JP | 6 | 1991–2007 |
| Osaka, JP | 1 | 1992 |