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Inventor

Hidekazu Tajima

Inventor
Kawasaki, JP

Overview

5→
Patents
2010–2013
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
C11DDetergent compositions33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
PatentTitleYear
8,367,312'Detergent for lithography and method of forming resist pattern with the same'20137,897,325'Lithographic rinse solution and method for forming patterned resist layer using the same'20117,811,748'Resist pattern forming method and composite rinse agent'20107,795,197'Cleaning liquid for lithography and method for resist pattern formation'20107,741,260'Rinsing fluid for lithography'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2013Patents assigned to TOKYO OHKA KOGYO CO LTD (5)· patent assignee history
2010–2013Based in Kawasaki, JP· patent location history
2013Patents assigned to KOSHIYAMA JUN (1)· patent assignee history
2013Patents assigned to KUMAGAI TOMOYA (1)· patent assignee history
2013Patents assigned to MIYAMOTO ATSUSHI (1)· patent assignee history
2013Patents assigned to SAWADA YOSHIHIRO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD52010–2013
KOSHIYAMA JUN12013
KUMAGAI TOMOYA12013
MIYAMOTO ATSUSHI12013
SAWADA YOSHIHIRO12013
Locations
LocationPatentsSpan
Kawasaki, JP52010–2013