Inventor
Woo Tae Park
Inventor
Singapore, SG
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B81Bprimary
B81BMicrostructural devices or systems, e.g. micromechanical devices26%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock19%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems14%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure12%
H10DInorganic electric semiconductor devices7%
Y10TTechnical subjects covered by former us classification7%
H01GCapacitors5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
G01CMeasuring distances, levels or bearings2%
G01RMeasuring electric variables2%
PatentTitleYear
8,922,227'Systems and methods for detecting surface charge'20148,692,337'Structure with a moving portion and a buried electrode for movement detection included in a multi-substrate configuration'20148,511,170'Pressure transducer having structure for monitoring surface charge'20138,487,387'MEMS sensor device with multi-stimulus sensing'20138,461,656'Device structures for in-plane and out-of-plane sensing micro-electro-mechanical systems (MEMS)'20138,387,464'Laterally integrated MEMS sensor device with multi-stimulus sensing'20138,316,718'MEMS pressure sensor device and method of fabricating same'20128,220,330'Vertically integrated MEMS sensor device with multi-stimulus sensing'20128,216,882'Method of producing a microelectromechanical (MEMS) sensor device'20128,186,221'Vertically integrated MEMS acceleration transducer'20128,119,431'Method of forming a micro-electromechanical system (MEMS) having a gap stop'20127,943,525'Method of producing microelectromechanical device with isolated microstructures'20117,919,006'Method of anti-stiction dimple formation under MEMS'20117,104,130'Ultra-miniature accelerometers'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006Based in Stanford, CA, US· patent location history
2011–2014Patents assigned to FREESCALE SEMICONDUCTOR INC (13)· patent assignee history
2011–2013Based in Chandler, AZ, US· patent location history
2012–2014Patents assigned to PARK WOO TAE (11)· patent assignee history
2012–2013Patents assigned to LIN YIZHEN (6)· patent assignee history
2012–2013Patents assigned to DESAI HEMANT D (4)· patent assignee history
2012–2013Patents assigned to LIU LIANJUN (3)· patent assignee history
2012–2014Based in Singapore, SG· patent location history
2014Based in Seoul, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FREESCALE SEMICONDUCTOR INC | 13 | 2011–2014 |
| PARK WOO TAEself | 11 | 2012–2014 |
| LIN YIZHEN | 6 | 2012–2013 |
| DESAI HEMANT D | 4 | 2012–2013 |
| LIU LIANJUN | 3 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Singapore, SG | 6 | 2012–2014 |
| Chandler, AZ, US | 6 | 2011–2013 |
| Seoul, KR | 1 | 2014 |
| Stanford, California, US | 1 | 2006 |