Inventor
Gerhard Karl Strauch
Inventor
Aachen, DE
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material41%
C30BSingle-crystal growth26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
B06BMethods or apparatus for generating or transmitting mechanical vibrations of infrasonic, sonic, or ultrasonic frequency, e.g. for performing mechanical work in general3%
E02DFoundations3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
10,385,530Method for compaction detection and control when compacting a soil with a deep vibrator20199,018,105'CVD method and CVD reactor'20158,846,501'Method for equipping an epitaxy reactor'20148,349,081'Gas distributor with pre-chambers arranged in planes'20138,298,337'Gas inlet element for a CVD reactor'20127,709,398'Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned'20107,625,448'Inlet system for an MOCVD reactor'20097,524,532'Process for depositing thin layers on a substrate in a process chamber of adjustable height'20097,332,038'Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates'20087,282,096'Arrangement comprising a support body and a substrate holder which is driven in rotation and gas-supported thereon'20077,147,718'Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates'20067,128,785'Method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates'20067,067,012'CVD coating device'20066,972,050'Method for depositing in particular crystalline layers, and device for carrying out the method'20056,962,624'Method and device for depositing in particular organic layers using organic vapor phase deposition'20056,905,548'Device for the deposition of crystalline layers on crystalline substrates'20056,798,060'Power device and direct aluminum bonded substrate thereof'20046,670,216'Method for manufacturing a power semiconductor device and direct bonded substrate thereof'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2004Patents assigned to IXYS CORP (2)· patent assignee history
2003–2004Based in Buerstadt, DE· patent location history
2005–2010Patents assigned to AIXTRON AG (11)· patent assignee history
2005–2015Based in Aachen, DE· patent location history
2012–2015Patents assigned to STRAUCH GERHARD KARL (4)· patent assignee history
2012–2013Patents assigned to BAUMANN PETER (2)· patent assignee history
2013–2015Patents assigned to AIXTRON SE (3)· patent assignee history
2013Based in Wohnsitz, DE· patent location history
2019Based in Vienna, AT· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AIXTRON AG | 11 | 2005–2010 |
| STRAUCH GERHARD KARLself | 4 | 2012–2015 |
| AIXTRON SE | 3 | 2013–2015 |
| BAUMANN PETER | 2 | 2012–2013 |
| IXYS CORP | 2 | 2003–2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aachen, DE | 14 | 2005–2015 |
| Buerstadt, DE | 2 | 2003–2004 |
| Vienna, AT | 1 | 2019 |
| Wohnsitz, DE | 1 | 2013 |