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Inventor

Ryuji Hatsuki

Inventor
Tokyo, JP

Overview

1→
Patents
2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Kprimary
C09KMaterials for miscellaneous applications, not provided for elsewhere25%
C23FNon-mechanical removal of metallic material from surface25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
9,797,046'Method for etching metal or metal oxide by ozone water, method for smoothing surface of metal or metal oxide by ozone water, and patterning method using ozone water'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to JAPAN SCIENCE & TECH AGENCY (1)· patent assignee history
2017Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JAPAN SCIENCE & TECH AGENCY12017
Locations
LocationPatentsSpan
Tokyo, JP12017