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Inventor

Haruto Hamano

Inventor
Tokyo, JP

Overview

4→
Patents
1996–1998
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C02Fprimary
C02FTreatment of water, waste water, sewage, or sludge50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
5,762,779'Method for producing electrolyzed water'19985,599,438'Method for producing electrolyzed water'19975,549,798'Wet processing apparatus having individual reactivating feedback paths for anode and cathode water'19965,543,030'Method for producing electrolyzed water'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–1998Patents assigned to NEC CORP (4)· patent assignee history
1996–1998Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NEC CORP41996–1998
Locations
LocationPatentsSpan
Tokyo, JP41996–1998