Inventor
Chao-Hu Liang
Inventor
Hsinchu, TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
H10DInorganic electric semiconductor devices38%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
PatentTitleYear
7,547,584'Method of reducing charging damage to integrated circuits during semiconductor manufacturing'20097,176,051'Method of reducing charging damage to integrated circuits during semiconductor manufacturing'20077,157,346'Method of reducing charging damage to integrated circuits during semiconductor manufacturing'20076,403,443'Method for reducing surface humps of doped amorphous silicon layer'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2009Patents assigned to UNITED MICROELECTRONICS CORP (4)· patent assignee history
2002Based in Hsinchu County, TW· patent location history
2007–2009Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 4 | 2002–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 3 | 2007–2009 |
| Hsinchu County, TW | 1 | 2002 |