Inventor
HISAJIRO NAKANO
Inventor
JP
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
B08BCleaning in general19%
B24BMachines, devices, or processes for grinding or polishing15%
B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers4%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock4%
PatentTitleYear
12,532,694Substrate cleaning device and substrate processing device202611,948,827Substrate support mechanism, substrate cleaning device and substrate processing method202411,664,252Cleaning device, polishing device, and device and method for calculating rotation speed of substrate in cleaning device202311,626,299Cover for swing member of substrate processing apparatus, swing member of substrate processing apparatus, and substrate processing apparatus202311,532,491Substrate cleaning apparatus, substrate processing apparatus, and method of cleaning substrate202211,495,475Method of cleaning a substrate202211,311,918Substrate cleaning apparatus and substrate cleaning method202211,180,303Storage container of scrubbing member and package of same2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to EBARA CORP (8)· patent assignee history
2021–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 8 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 8 | 2021–2026 |