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Inventor

KEIKO HADA

Inventor
JP

Overview

3→
Patents
2023–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
B08BCleaning in general10%
C03BManufacture, shaping, or supplementary processes10%
C03CChemical composition of glasses, glazes or vitreous enamels10%
H01JElectric discharge tubes or discharge lamps10%
PatentTitleYear
12,237,173Substrate processing method, substrate processing apparatus and substrate processing system202511,557,493Substrate cleaning apparatus and substrate cleaning method202311,548,804Method and apparatus for processing oxygen-containing workpiece2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2025Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2023–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD32023–2025
Locations
LocationPatentsSpan
JP32023–2025