Inventor
TSUTOMU OGIHARA
Inventor
JP
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds13%
H01LSemiconductor devices11%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
C08LCompositions of macromolecular compounds6%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%
C07CAcyclic or carbocyclic compounds4%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium4%
C07DHeterocyclic compounds3%
PatentTitleYear
12,498,639Material for forming adhesive film, method for forming adhesive film using the same, and patterning process using material for forming adhesive film202512,379,663Material for forming organic film, patterning process, and polymer202512,351,742Material for forming adhesive film, patterning process, and method for forming adhesive film202512,332,565Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process202512,332,567Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound202512,174,541Composition for forming silicon-containing resist underlayer film and patterning process202412,105,420Coating-type composition for forming organic film, patterning process, polymer, and method for manufacturing polymer202412,085,857Composition for forming silicon-containing resist underlayer film and patterning process202412,032,293Composition for forming organic film, patterning process, and polymer202412,013,640Resist underlayer film material, patterning process, and method for forming resist underlayer film202412,001,138Composition for forming silicon-containing resist underlayer film and patterning process202411,914,295Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process202411,692,066Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film202311,676,814Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process202311,635,691Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer202311,614,686Resist composition and patterning process202311,615,978Method for controlling flatness, method for forming coating film, apparatus for controlling flatness, and apparatus for forming coating film202311,592,287Method for measuring distance of diffusion of curing catalyst202311,518,774Method for producing iodine-containing silicon compound202211,500,292Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film202211,485,824Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process202211,480,879Composition for forming silicon-containing resist underlayer film and patterning process202211,385,544Composition for forming silicon-containing resist underlayer film and patterning process202211,366,386Patterning process202211,307,497Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process202211,267,937Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate202211,231,649Patterning process202211,181,821Composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, patterning process, and polymer2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to SHINETSU CHEMICAL CO (28)· patent assignee history
2021–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 28 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 28 | 2021–2025 |