LexDanaLexDanabeta
Inventor

Arno Jan Bleeker

Inventor
Westerhoven, NL

Overview

99→
Patents
1991–2020
Patent span
Physics
Primary field (CPC G)

Patents· 99 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices52%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
G02BOptical elements, systems or apparatus4%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
H01JElectric discharge tubes or discharge lamps3%
B82YSpecific uses or applications of nanostructures2%
G11BInformation storage based on relative movement between record carrier and transducer2%
H04WWireless communication networks2%
A47CChairs1%
PatentTitleYear
10,712,667Optical device and associated system202010,241,055Method and apparatus for angular-resolved spectroscopic lithography characterization201910,222,702Radiation source20199,946,167Metrology method and inspection apparatus, lithographic system and device manufacturing method20189,823,576'Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method'20179,715,183'Device, lithographic apparatus, method for guiding radiation and device manufacturing method'20179,696,636'Lithographic apparatus, device manufacturing method and computer program'20179,690,210'Lithographic apparatus and device manufacturing method'20179,594,304'Lithography apparatus, a device manufacturing method, a method of manufacturing an attenuator'20179,568,831'Lithographic apparatus and device manufacturing method'20179,513,561'Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method'20169,494,869'Lithographic apparatus and device manufacturing method'20169,341,960'Lithographic apparatus and device manufacturing method'20169,304,077'Inspection apparatus and method'20169,176,392'Lithographic apparatus and device manufacturing method using dose control'20159,140,998'Metrology method and inspection apparatus, lithographic system and device manufacturing method'20158,792,085'Lithographic apparatus, substrate table, and method for enhancing substrate release properties'20148,760,662'Method and apparatus for angular-resolved spectroscopic lithography characterization'20148,553,230'Method and apparatus for angular-resolved spectroscopic lithography characterization'20138,411,287'Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate'20138,189,172'Lithographic apparatus and method'20128,159,647'Lithographic apparatus and device manufacturing method'20128,054,467'Method and apparatus for angular-resolved spectroscopic lithography characterization'20118,018,578'Pellicle, lithographic apparatus and device manufacturing method'20117,965,380'Lithographic apparatus and device manufacturing method'20117,924,406'Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels'20117,911,586'Lithographic apparatus and device manufacturing method'20117,894,037'Lithographic apparatus and device manufacturing method'20117,894,041'Limiting a portion of a patterning device used to pattern a beam'20117,872,244'Lithographic apparatus and device manufacturing method'20117,859,647'Lithographic apparatus and device manufacturing method'20107,826,035'Lithographic apparatus and device manufacturing method'20107,791,708'Lithographic apparatus, substrate table, and method for enhancing substrate release properties'20107,791,732'Method and apparatus for angular-resolved spectroscopic lithography characterization'20107,773,199'Methods and systems to compensate for a stitching disturbance of a printed pattern'20107,728,956'Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate using a data buffer that stores pattern variation data'20107,713,667'System and method for generating pattern data used to control a pattern generator'20107,697,128'Method of imaging radiation from an object on a detection device and an inspection device for inspecting an object'20107,688,423'Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones'20107,671,968'Lithographic apparatus having masking parts and device manufacturing method'20107,630,054'Methods and systems to compensate for a stitching disturbance of a printed pattern'20097,548,302'Lithographic apparatus and device manufacturing method'20097,522,266'Lithographic apparatus and device manufacturing method'20097,508,494'Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate'20097,499,146'Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping'20097,474,384'Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus'20097,460,208'Lithographic apparatus and device manufacturing method'20087,459,710'Lithographic apparatus, method for calibrating and device manufacturing method'20087,440,078'Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units'20087,433,033'Inspection method and apparatus using same'20087,428,040'Lithographic apparatus and device manufacturing method'20087,410,736'Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones'20087,411,652'Lithographic apparatus and device manufacturing method'20087,403,266'Maskless lithography systems and methods utilizing spatial light modulator arrays'20087,400,382'Light patterning device using tilting mirrors in a superpixel form'20087,394,524'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20087,388,650'Lithographic apparatus and device manufacturing method'20087,385,677'Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam'20087,379,579'Imaging apparatus'20087,321,417'Spatial light modulator, lithographic apparatus and device manufacturing method'20087,304,718'Lithographic apparatus and device manufacturing method'20077,274,502'System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks'20077,259,829'Lithographic apparatus and device manufacturing method'20077,239,393'Calibration method for a lithographic apparatus and device manufacturing method'20077,196,772'Lithographic apparatus and device manufacturing method'20077,190,434'Lithographic apparatus and device manufacturing method'20077,183,566'Lithographic apparatus for manufacturing a device'20077,177,012'Lithographic apparatus and device manufacturing method'20077,173,687'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20077,167,231'Method and apparatus for printing large data flows'20077,161,661'Lithographic apparatus and device manufacturing method'20077,154,587'Spatial light modulator, lithographic apparatus and device manufacturing method'20067,141,340'Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby'20067,133,121'Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region'20067,133,118'Lithographic apparatus and device manufacturing method'20067,123,348'Lithographic apparatus and method utilizing dose control'20067,119,881'Lithographic apparatus and device manufacturing method'20067,102,733'System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool'20067,102,732'Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical element'20067,061,591'Maskless lithography systems and methods utilizing spatial light modulator arrays'20067,053,981'Lithographic apparatus and device manufacturing method'20067,046,413'System and method for dose control in a lithographic system'20067,023,525'Imaging apparatus'20067,016,015'Lithographic apparatus and device manufacturing method'20067,009,682'Lithographic apparatus and device manufacturing method'20067,002,666'Lithographic apparatus and device manufacturing method'20066,999,161'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20066,992,754'Lithographic apparatus and device manufacturing method'20066,989,920'System and method for dose control in a lithographic system'20066,876,440'METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A PRINTED PATTERN IN A MASKLESS LITHOGRAPHY SYSTEM UTILIZING OVERLAP OF EXPOSURE ZONES WITH ATTENUATION OF THE AERIAL IMAGE IN THE OVERLAP REGION'20056,870,601'Lithographic apparatus and device manufacturing method'20056,864,958'Lithographic apparatus and device manufacturing method'20056,778,257'Imaging apparatus'20046,646,274'Lithographic projection apparatus'20036,633,366'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20036,429,440'Lithography apparatus having a dynamically variable illumination beam'20026,362,871'Lithographic apparatus'20025,268,579'Monopole magnetic lens field'19935,003,172'Auger spectrometry'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–1993Based in Delft, NL· patent location history
2002–2020Patents assigned to ASML NETHERLANDS BV (78)· patent assignee history
2002Based in Eindhoven, NL· patent location history
2003–2020Based in Westerhoven, NL· patent location history
2003Based in NJ, US· patent location history
2005–2012Patents assigned to ASML HOLDING NV (19)· patent assignee history
2007–2008Based in Waalre, NL· patent location history
2012–2017Patents assigned to BLEEKER ARNO JAN (9)· patent assignee history
2013–2015Patents assigned to COENE WILLEM MARIE JULIA MARCEL (2)· patent assignee history
2013Patents assigned to PELLEMANS HENRICUS PETRUS MARIA (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV782002–2020
ASML HOLDING NV192005–2012
BLEEKER ARNO JANself92012–2017
COENE WILLEM MARIE JULIA MARCEL22013–2015
PELLEMANS HENRICUS PETRUS MARIA22013
Locations
LocationPatentsSpan
Westerhoven, NL922003–2020
Waalre, NL22007–2008
Eindhoven, NL22002
Delft, NL21991–1993
New Jersey, US12003