LexDanaLexDanabeta
Inventor

Sho OIKAWA

Inventor
JP

Overview

4→
Patents
2021–2023
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps27%
H01LSemiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems7%
C23CCoating metallic material7%
H05HPlasma technique7%
PatentTitleYear
11,721,595Processing method and plasma processing apparatus202311,610,766Target object processing method and plasma processing apparatus202311,328,934Etching method and substrate processing apparatus202211,211,229Processing method and plasma processing apparatus2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2023Patents assigned to TOKYO ELECTRON LTD (4)· patent assignee history
2021–2023Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD42021–2023
Locations
LocationPatentsSpan
JP42021–2023