Inventor

Andrej S. Mitrovic

Inventor

Phoenix, AZ, US

Overview

33→

Patents

2004–2012

Patent span

Electricity

Primary field (CPC H)

Patents· 33 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary

H01JElectric discharge tubes or discharge lamps35%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%

H05HPlasma technique10%

G06FElectric digital data processing6%

Y02PClimate change mitigation technologies in the production or processing of goods6%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

G01BMeasuring length, thickness or similar linear dimensions3%

G05BControl or regulating systems in general3%

H01PWaveguides3%

C23FNon-mechanical removal of metallic material from surface2%

PatentTitleYear

8,296,687'System and method for using first-principles simulation to analyze a process performed by a semiconductor processing tool'2012 8,173,980'Gas cluster ion beam system with cleaning apparatus'2012 8,073,667'System and method for using first-principles simulation to control a semiconductor manufacturing process'2011 8,050,900'System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process'2011 8,036,869'System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical model'2011 8,032,348'System and method for using first-principles simulation to facilitate a semiconductor manufacturing process'2011 8,014,991'System and method for using first-principles simulation to characterize a semiconductor manufacturing process'2011 7,789,963'Chuck pedestal shield'2010 7,591,923'Apparatus and method for use of optical system with a plasma processing system'2009 7,353,141'Method and system for monitoring component consumption'2008 7,241,397'Honeycomb optical window deposition shield and method for a plasma processing system'2007 7,233,878'Method and system for monitoring component consumption'2007 7,208,067'Method and system for monitoring RF impedance to determine conditions of a wafer on an electrostatic chuck'2007 7,186,313'Plasma chamber wall segment temperature control'2007 7,164,236'Method and apparatus for improved plasma processing uniformity'2007 7,109,788'Apparatus and method of improving impedance matching between an RF signal and a multi- segmented electrode'2006 7,075,031'Method of and structure for controlling electrode temperature'2006 7,073,383'Apparatus and method for determining clamping status of semiconductor wafer'2006 7,020,583'Method and apparatus for determining chemistry of part\'s residual contamination'2006 7,015,414'Method and apparatus for determining plasma impedance'2006 6,965,287'Low reflection microwave window'2005 6,962,664'Controlled method for segmented electrode apparatus and method for plasma processing'2005 6,958,484'Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy'2005 6,917,204'Addition of power at selected harmonics of plasma processor drive frequency'2005 6,899,527'Closed-drift hall effect plasma vacuum pump for process reactors'2005 6,863,020'Segmented electrode apparatus for plasma processing'2005 6,824,363'Linear inductive plasma pump for process reactors'2004 6,812,646'Method and device for attenuating harmonics in semiconductor plasma processing systems'2004 6,806,653'Method and structure to segment RF coupling to silicon electrode'2004 6,729,850'Applied plasma duct system'2004 6,713,969'Method and apparatus for determination and control of plasma state'2004 6,700,458'Device and method for coupling two circuit components which have different impedances'2004 6,677,604'Optical system and method for plasma optical emission analysis'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2012Patents assigned to TOKYO ELECTRON LTD (32)· patent assignee history

2004Patents assigned to GALLAGHER JAMES P (1)· patent assignee history

2004–2012Based in Phoenix, AZ, US· patent location history

2011–2012Patents assigned to MITROVIC ANDREJ (3)· patent assignee history

2011–2012Patents assigned to STRANG ERIC J (2)· patent assignee history

2012Patents assigned to GRAF MICHAEL (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TOKYO ELECTRON LTD	32	2004–2012
MITROVIC ANDREJself	3	2011–2012
STRANG ERIC J	2	2011–2012
GALLAGHER JAMES P	1	2004
GRAF MICHAEL	1	2012

Locations

Location	Patents	Span
Phoenix, AZ, US	33	2004–2012