Inventor
Fu-Yang Yu
Inventor
Hsinchu, TW
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material33%
B24BMachines, devices, or processes for grinding or polishing25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
B01DSeparation8%
G01GWeighing8%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
6,676,801'Pressure suppression device for chemical mechanical polishing machine and method thereof'20046,648,729'Wafer pressure regulation system for polishing machine'20036,352,244'Auxiliary gasline-heating unit in chemical vapor deposition'20026,322,057'Auxiliary gasline-heating unit in chemical vapor deposition'20016,307,163'Chemical mixer tank calibrator and calibrating method for the same'20016,228,420'Method to maintain consistent thickness of thin film deposited by chemical vapor deposition'20016,165,255'Chemical-liquid controlling apparatus'20006,129,043'Gas tube with heating apparatus'20006,120,366'Chemical-mechanical polishing pad'20005,604,152'CVD process for deposition of amorphous silicon'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2004Patents assigned to UNITED MICROELECTRONICS CORP (10)· patent assignee history
1997–2004Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 10 | 1997–2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 10 | 1997–2004 |