Inventor
JONGWOO SUN
Inventor
KR
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01LSemiconductor devices22%
H05HPlasma technique7%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light4%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling2%
C23CCoating metallic material2%
G01BMeasuring length, thickness or similar linear dimensions2%
H02NElectric machines not otherwise provided for2%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation2%
PatentTitleYear
12,315,703Plasma processing apparatus and methods of manufacturing semiconductor device using the same202512,211,672Apparatus and method for plasma etching202512,087,554Substrate treating apparatus and substrate treating system having the same202412,068,140Method and system for monitoring substrate processing apparatus202411,984,304Apparatus and method for plasma etching202411,929,239Plasma processing apparatus and semiconductor device manufacturing method using the same202411,862,440Semiconductor processing equipment including electrostatic chuck for plasma processing202411,715,628Method of forming plasma processing apparatus, related apparatus, and method of forming semiconductor device using the same202311,450,545Capacitively-coupled plasma substrate processing apparatus including a focus ring and a substrate processing method using the same202211,430,679Semiconductor manufacturing apparatus202211,348,760Plasma processing apparatus and method of manufacturing semiconductor device using the same202211,264,291Sensor device and etching apparatus having the same202211,251,022Gas supply assembly and substrate processing apparatus including the same202211,215,506Substrate processing apparatus, substrate processing module, and semiconductor device fabrication method2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to SAMSUNG ELECTRONICS CO LTD (14)· patent assignee history
2022–2025Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 14 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 14 | 2022–2025 |