Inventor
Shigeru Matsuno
Inventor
Hyogo, JP
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10DInorganic electric semiconductor devices12%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
B01DSeparation5%
F16KValves5%
G02BOptical elements, systems or apparatus5%
H01GCapacitors4%
H04BTransmission3%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation3%
PatentTitleYear
10,936,306Vehicle control system and software compatibility checking method20218,652,869'Method for roughening substrate surface and method for manufacturing photovoltaic device'20148,138,442'Wire electric discharge machining method, semiconductor wafer manufacturing method, and solar battery cell manufacturing method'20128,039,396'Method for manufacturing photovoltaic device'20117,731,162'Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method'20107,637,482'Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method'20097,422,198'Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method'20087,163,197'Liquid substance supply device for vaporizing system, vaporizer, and vaporization performance appraisal method'20077,078,330'Metal electrode and bonding method using the metal electrode'20066,882,760'Polarization dispersion compensating apparatus'20056,810,179'Variable dispersion compensator'20046,807,322'PMD compensating apparatus for controlling polarization controller based on detection of magnitude of waveform distortion'20046,690,860'Method of manufacturing grating'20046,643,430'Temperature control system for a grating'20036,638,880'Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device'20036,512,297'CVD source material for forming an electrode, and electrode and wiring film for capacitor formed therefrom'20036,470,144'Vaporizer for chemical vapor deposition apparatus, chemical vapor deposition apparatus, and semiconductor device manufactured thereby'20026,448,191'Method of forming high dielectric constant thin film and method of manufacturing semiconductor device'20026,312,526'Chemical vapor deposition apparatus and a method of manufacturing a semiconductor device'20016,273,957'Vaporizing device for CVD source materials and CVD apparatus employing the same'20016,235,649'Method of forming high dielectric constant thin film and method of manufacturing semiconductor device'20016,236,559'Capacitor'20016,231,658'Chemical vapor deposition source for depositing lead zirconate titanate film'20016,212,059'Capacitor including barium strontium titanate film'20016,103,002'CVD method for forming oxide-system dielectric thin film'20006,063,443'CVD method for forming oxide-system dielectric thin film'20005,555,154'CVD Raw Material for oxide-system dielectric thin film and capacitor produced by CVD method using the CVD raw material'19965,372,850'Method of manufacturing an oxide-system dielectric thin film using CVD method'19945,034,372'Plasma based method for production of superconductive oxide layers'19914,756,693'Apparatus to spread a sample of seat top material'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1991–2014Patents assigned to MITSUBISHI ELECTRIC CORP (28)· patent assignee history
1991Based in Amagasaki, JP· patent location history
1994–2003Based in Hyogo, JP· patent location history
2001–2014Based in Tokyo, JP· patent location history
2007–2010Based in Sagamihara, JP· patent location history
2008–2010Patents assigned to SHIMADZU CORP (3)· patent assignee history
2012–2014Patents assigned to MATSUNO SHIGERU (2)· patent assignee history
2012Patents assigned to IMAI YOSHIHITO (1)· patent assignee history
2012Patents assigned to IWATA TAKAAKI (1)· patent assignee history
2021Based in Chiryu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 28 | 1991–2014 |
| SHIMADZU CORP | 3 | 2008–2010 |
| MATSUNO SHIGERUself | 2 | 2012–2014 |
| IMAI YOSHIHITO | 1 | 2012 |
| IWATA TAKAAKI | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hyogo, JP | 12 | 1994–2003 |
| Tokyo, JP | 11 | 2001–2014 |
| Sagamihara, JP | 4 | 2007–2010 |
| Chiryu, JP | 1 | 2021 |
| Amagasaki, JP | 1 | 1991 |