Inventor
Yang-Yao LEE
Inventor
TW
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Gprimary
C09GPolishing compositions25%
C09KMaterials for miscellaneous applications, not provided for elsewhere25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
12,428,580CMP composition including an anionic abrasive2025Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2025Patents assigned to CMC MAT INC (1)· patent assignee history
2025Patents assigned to CMC MAT LLC (1)· patent assignee history
2025Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CMC MAT INC | 1 | 2025 |
| CMC MAT LLC | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 1 | 2025 |