Inventor
Kimio Motoda
Inventor
Kumamoto, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B05Cprimary
B05CApparatus for applying fluent materials to surfaces, in general23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
B05DProcesses for applying fluent materials to surfaces, in general7%
B05BSpraying apparatus4%
B08BCleaning in general4%
A61LMethods or apparatus for sterilising materials or objects in general3%
F21VFunctional features or details of lighting devices or systems thereof3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
PatentTitleYear
9,238,245'Coating apparatus and method for filling coating liquid'20167,905,195'Floating-type substrate conveying and processing apparatus'20116,749,688'Coating method and apparatus for semiconductor process'20046,514,343'Coating apparatus'20036,398,879'Method and apparatus for cleaning treatment'20026,168,665'Substrate processing apparatus'20016,159,288'Method and apparatus for cleaning treatment'20006,058,544'Scrubbing apparatus and scrubbing method'20006,013,317'Coating apparatus and method therefor'20006,010,570'Apparatus for forming coating film for semiconductor processing'20005,919,520'Coating method and apparatus for semiconductor process'19995,906,860'Apparatus for treating a substrate with resist and resist-treating method'19995,853,803'Resist processing method and apparatus'19985,853,812'Method and apparatus for processing substrates'19985,803,970'Method of forming a coating film and coating apparatus'19985,762,708'Coating apparatus therefor'19985,718,763'Resist processing apparatus for a rectangular substrate'19985,695,817'Method of forming a coating film'19975,688,322'Apparatus for coating resist on substrate'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2016Patents assigned to TOKYO ELECTRON LTD (19)· patent assignee history
1997–1998Patents assigned to TEL KYUSHU KK (3)· patent assignee history
1997–2016Based in Kumamoto, JP· patent location history
1998Patents assigned to TOKYO ELECTRON KYUCHU LIMITED (1)· patent assignee history
2011Based in Koshi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 19 | 1997–2016 |
| TEL KYUSHU KK | 3 | 1997–1998 |
| TOKYO ELECTRON KYUCHU LIMITED | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kumamoto, JP | 18 | 1997–2016 |
| Koshi, JP | 1 | 2011 |