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Inventor

TAIKI MIURA

Inventor
JP

Overview

2→
Patents
2022–2026
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%
H01LSemiconductor devices17%
PatentTitleYear
12,560,863Etching method and plasma processing system202611,404,279Etching method and substrate processing apparatus2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history
2022–2026Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD22022–2026
Locations
LocationPatentsSpan
JP22022–2026