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Inventor

Cari H. Shim

Inventor
Sunnyvale, CA, US

Overview

3→
Patents
1995–2000
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material43%
C04BLime, magnesia29%
C30BSingle-crystal growth29%
PatentTitleYear
6,030,514'Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor'20005,494,439'Si/SiC composite material and method for making Si/SiC composite material'19965,417,803'Method for making Si/SiC composite material'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–1996Patents assigned to INTEL CORP (2)· patent assignee history
1995–2000Based in Sunnyvale, CA, US· patent location history
2000Patents assigned to MATERIALS RESEARCH CORP (1)· patent assignee history
2000Patents assigned to SONY CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INTEL CORP21995–1996
MATERIALS RESEARCH CORP12000
SONY CORP12000
Locations
LocationPatentsSpan
Sunnyvale, California, US31995–2000