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Inventor

Sang Yil Chang

Inventor
Yongin-si, KR

Overview

2→
Patents
2014–2015
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G06FElectric digital data processing25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
Y02PClimate change mitigation technologies in the production or processing of goods25%
PatentTitleYear
9,064,085'Method for adjusting target layout based on intensity of background light in etch mask layer'20158,856,695'Method for generating post-OPC layout in consideration of top loss of etch mask layer'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2015Patents assigned to IBM (2)· patent assignee history
2014–2015Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
2014–2015Based in Yongin-si, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM22014–2015
SAMSUNG ELECTRONICS CO LTD22014–2015
Locations
LocationPatentsSpan
Yongin-si, KR22014–2015