Inventor
Hyo-San Lee
Inventor
Suwon-si, KR
Overview
Patents· 28 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01LSemiconductor devices16%
H10BElectronic memory devices12%
H10DInorganic electric semiconductor devices12%
B08BCleaning in general4%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
C11DDetergent compositions3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H01JElectric discharge tubes or discharge lamps3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
10,795,263Compositions for removing photoresist202010,679,843Method of treating substrates using supercritical fluids202010,668,403Source supplier for a supercritical fluid, substrate processing apparatus having the same202010,576,582Spot heater and device for cleaning wafer using the same202010,525,566Preparing conditioning disk for chemical mechanical polishing and chemical mechanical polishing method including the same202010,395,951Method of cleaning a substrate and apparatus for performing the same201910,332,762Chemical liquid supply apparatus and semiconductor processing apparatus having the same201910,083,829Apparatus for treating substrates using supercritical fluids, substrate treatment system including the same and method of treating substrates using the same201810,029,332Spot heater and device for cleaning wafer using the same201810,025,192Methods of manufacturing semiconductor devices using a composition for removing photoresist and methods of removing photoresist from a semiconductor substrate20189,754,806'Apparatus for treating wafers using supercritical fluid'20179,394,509'Cleaning solution composition and method of cleaning semiconductor device using the same'20168,951,383'Apparatus for treating wafers using supercritical fluid'20158,795,541'Substrate processing method and substrate processing system for performing the same'20148,790,470'Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods'20148,766,343'Integrated circuit capacitors having sidewall supports'20148,685,272'Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor device'20148,585,917'Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods'20138,557,651'Method of manufacturing a semiconductor device using an etchant'20138,518,772'Fabricating method of semiconductor device'20138,344,385'Vertical-type semiconductor device'20138,211,804'Methods of forming a hole having a vertical profile and semiconductor devices having a vertical hole'20128,119,476'Methods of forming integrated circuit capacitors having sidewall supports and capacitors formed thereby'20128,084,367'Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods'20117,959,738'Method of removing photoresist and method of manufacturing a semiconductor device'20117,857,939'Apparatus for treating wafers using supercritical fluid'20107,709,277'PAA-based etchant, methods of using same, and resultant structures'20107,176,041'PAA-based etchant, methods of using same, and resultant structures'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (28)· patent assignee history
2007–2017Based in Suwon-si, KR· patent location history
2010Based in Gyeonggi-do, KR· patent location history
2011–2015Patents assigned to LEE HYO-SAN (12)· patent assignee history
2011–2015Patents assigned to LEE KUN-TACK (10)· patent assignee history
2011–2014Patents assigned to OH JUNG-MIN (6)· patent assignee history
2011–2015Patents assigned to HAN JEONG-NAM (5)· patent assignee history
2015Based in Kyungki-do, KR· patent location history
2016–2020Based in Hwaseong-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 28 | 2007–2020 |
| LEE HYO-SANself | 12 | 2011–2015 |
| LEE KUN-TACK | 10 | 2011–2015 |
| OH JUNG-MIN | 6 | 2011–2014 |
| HAN JEONG-NAM | 5 | 2011–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwon-si, KR | 15 | 2007–2017 |
| Hwaseong-si, KR | 11 | 2016–2020 |
| Kyungki-do, KR | 1 | 2015 |
| Gyeonggi-do, KR | 1 | 2010 |