Inventor
Daita Kouno
Inventor
Tokyo, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices55%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds18%
PatentTitleYear
8,895,229'Composition for formation of upper layer film, and method for formation of photoresist pattern'20148,697,344'Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern'20148,507,189'Upper layer film forming composition and method of forming photoresist pattern'20138,435,718'Upper layer-forming composition and photoresist patterning method'20138,431,332'Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern'20138,076,053'Upper layer-forming composition and photoresist patterning method'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2014Patents assigned to JSR CORP (6)· patent assignee history
2011–2014Patents assigned to KOUNO DAITA (5)· patent assignee history
2011–2014Patents assigned to NISHIMURA YUKIO (5)· patent assignee history
2011–2014Patents assigned to NAKASHIMA HIROMITSU (4)· patent assignee history
2011–2013Patents assigned to DOUGAUCHI HIROSHI (2)· patent assignee history
2011–2014Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| JSR CORP | 6 | 2011–2014 |
| KOUNO DAITAself | 5 | 2011–2014 |
| NISHIMURA YUKIO | 5 | 2011–2014 |
| NAKASHIMA HIROMITSU | 4 | 2011–2014 |
| DOUGAUCHI HIROSHI | 2 | 2011–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 6 | 2011–2014 |