Inventor
Reinder Teun Plug
Inventor
Eindhoven, NL
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices57%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
G01NInvestigating or analysing materials by determining their chemical or physical properties9%
G06FElectric digital data processing4%
H05BElectric heating4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
10,884,342Method and apparatus for predicting performance of a metrology system20218,636,458'Integrated post-exposure bake track'20148,411,287'Metrology method and apparatus, lithographic apparatus, device manufacturing method and substrate'20137,961,309'Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate'20117,679,714'Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method'20107,659,988'Apparatus for angular-resolved spectroscopic lithography characterization and device manufacturing method'20107,586,598'Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate'20097,511,797'Lithography system, control system and device manufacturing method'20097,502,103'Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate'20097,480,050'Lithographic system, sensor, and method of measuring properties of a substrate'20097,352,439'Lithography system, control system and device manufacturing method'20087,113,253'Method, apparatus and computer product for substrate processing'20066,420,716'Servo control method and its application in a lithographic apparatus'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2021Patents assigned to ASML NETHERLANDS BV (13)· patent assignee history
2002–2021Based in Eindhoven, NL· patent location history
2013Patents assigned to BLEEKER ARNO JAN (1)· patent assignee history
2013Patents assigned to COENE WILLEM MARIE JULIA MARCEL (1)· patent assignee history
2014Patents assigned to AUER-JONGEPIER SUZAN L (1)· patent assignee history
2014Patents assigned to BARTRAY PETRUS R (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 13 | 2002–2021 |
| AUER-JONGEPIER SUZAN L | 1 | 2014 |
| BARTRAY PETRUS R | 1 | 2014 |
| BLEEKER ARNO JAN | 1 | 2013 |
| COENE WILLEM MARIE JULIA MARCEL | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 13 | 2002–2021 |