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Inventor

Hisashi Tsukazaki

Inventor
Hyogo, JP

Overview

5→
Patents
1989–1998
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material44%
B05BSpraying apparatus11%
H01JElectric discharge tubes or discharge lamps11%
H05HPlasma technique11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
PatentTitleYear
5,837,094'Semiconductor manufacturing apparatus'19985,525,158'Thin film deposition apparatus'19965,211,994'Apparatus for and method of forming thin film'19935,099,791'Cluster beam thin film deposition apparatus with thermionic electron control'19924,812,326'Evaporation source with a shaped nozzle'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–1998Patents assigned to MITSUBISHI ELECTRIC CORP (4)· patent assignee history
1989–1996Based in Hyogo, JP· patent location history
1993Patents assigned to MITSUBISHI DENKI KABUBSHIKI KA (1)· patent assignee history
1993Based in Amagasaki, JP· patent location history
1998Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI ELECTRIC CORP41989–1998
MITSUBISHI DENKI KABUBSHIKI KA11993
Locations
LocationPatentsSpan
Hyogo, JP31989–1996
Tokyo, JP11998
Amagasaki, JP11993