Inventor
Masaru Mitsui
Inventor
Yamanashi, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices47%
C23CCoating metallic material19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
LOC137%
C03CChemical composition of glasses, glazes or vitreous enamels5%
H01JElectric discharge tubes or discharge lamps5%
Y10TTechnical subjects covered by former us classification5%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form2%
E04GScaffolding2%
PatentTitleYear
8,652,306'Method for manufacturing mask blank, method for manufacturing transfer mask, sputtering target for manufacturing mask blank'20148,039,178'Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks'20117,862,960'Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks'20117,833,387'Mask blank manufacturing method and sputtering target for manufacturing the same'20107,635,950'Short-arc type high pressure discharge lamp having gaps formed among electrode axes, metal foils and a glass material surface'20097,601,468'Process for manufacturing half-tone phase shifting mask blanks'2009D0568839'Photomask blank'2008D0543160'Photomask blank'20077,217,481'Photomask blank, photomask, methods of manufacturing the same and methods of forming micropattern'2007D0537048'Photomask blank'20077,141,339'Process for manufacturing half-tone phase shifting mask blanks'20067,026,077'Photomask blank manufacturing method'20066,899,979'Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern'20056,762,000'Phase shift mask blank, photo mask blank and manufacturing apparatus and method of blanks'20046,723,477'Method for manufacturing phase shift mask blank and method for manufacturing phase shift mask'20046,475,681'Phase shift mask and phase shift mask blank'20026,242,138'Phase shift mask and phase shift mask blank'20016,153,341'Phase shift mask and phase shift mask blank'20006,037,083'Halftone phase shift mask blanks, halftone phase shift masks, and fine pattern forming method'20005,942,356'Phase shift mask and phase shift mask blank'19995,858,582'Phase shift mask and phase shift mask blank'19995,849,439'Method for preparing phase shift mask blank, and phase mask'19985,804,337'Phase shift mask and phase shift mask blank'19985,635,315'Phase shift mask and phase shift mask blank'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2014Patents assigned to HOYA CORP (22)· patent assignee history
1997–2010Based in Yamanashi, JP· patent location history
1998–2008Based in Mukawa, JP· patent location history
2000–2014Based in Tokyo, JP· patent location history
2005Patents assigned to HOYO CORP (1)· patent assignee history
2009Patents assigned to ORC MFG CO LTD (1)· patent assignee history
2009Patents assigned to SONY CORP (1)· patent assignee history
2009Based in Nagano, JP· patent location history
2011Based in Hokuto, JP· patent location history
2014Patents assigned to MITSUI MASARU (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HOYA CORP | 22 | 1997–2014 |
| HOYO CORP | 1 | 2005 |
| MITSUI MASARUself | 1 | 2014 |
| ORC MFG CO LTD | 1 | 2009 |
| SONY CORP | 1 | 2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yamanashi, JP | 11 | 1997–2010 |
| Mukawa, JP | 6 | 1998–2008 |
| Tokyo, JP | 4 | 2000–2014 |
| Hokuto, JP | 2 | 2011 |
| Nagano, JP | 1 | 2009 |