Inventor
Yi-An Lin
Inventor
Taipei, TW
Overview
Patents· 26 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices29%
H10DInorganic electric semiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G06FElectric digital data processing8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
B24BMachines, devices, or processes for grinding or polishing5%
B29BPreparation or pretreatment of the material to be shaped2%
B29CShaping or joining of plastics2%
C23CCoating metallic material2%
F21VFunctional features or details of lighting devices or systems thereof2%
PatentTitleYear
11,011,391Semiconductor structure and method for fabricating the same202110,971,355Substrates and methods for forming the same202110,797,156Method of forming the gate electrode of field effect transistor202010,755,995Warpage control of semiconductor die202010,651,091Wrap-around contact on FinFET202010,516,031Method of forming the gate electrode of field effect transistor201910,453,811Post passivation interconnect and fabrication method therefor201910,391,608Backside polisher with dry frontside design and method using the same201910,290,596Semiconductor device having a passivation layer and method of making the same201910,269,649Wrap-around contact on FinFET20199,941,367Wrap-around contact on FinFET20189,865,477'Backside polisher with dry frontside design and method using the same'20189,812,551'Method of forming the gate electrode of field effect transistor'20179,589,803'Gate electrode of field effect transistor'20179,443,769'Wrap-around contact'20169,337,103'Method for removing hard mask oxide and making gate structure of semiconductor devices'20169,263,252'Method of protecting an interlayer dielectric layer and structure formed thereby'20169,072,127'Lighting system and its luminaries with a respective lamp control module'20158,940,597'In-situ metal gate recess process for self-aligned contact application'20158,853,052'Method of manufacturing a semiconductor device'20148,713,096'State control of remote hosts for management of distributed applications'20148,452,752'Prioritizing crawl lists using social networking rankings'20138,425,818'Underwater pelletizing machine and method of extruding foamed thermoplastic pellets'20138,386,454'Systems and methods for providing advanced search result page content'20138,074,116'Exception raised notification'20117,958,109'Intent driven search result rich abstracts'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2014Patents assigned to MICROSOFT CORP (3)· patent assignee history
2011–2013Based in Sunnyvale, CA, US· patent location history
2013–2017Patents assigned to LIN YI-AN (5)· patent assignee history
2014–2017Patents assigned to CHEN NENG-KUO (3)· patent assignee history
2014–2017Patents assigned to SUN SEY-PING (3)· patent assignee history
2014–2020Based in Taipei, TW· patent location history
2016–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (14)· patent assignee history
2019Based in Hsinchu, TW· patent location history
2020Based in Taichung, TW· patent location history
2021Based in Taoyuan, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 14 | 2016–2020 |
| LIN YI-ANself | 5 | 2013–2017 |
| CHEN NENG-KUO | 3 | 2014–2017 |
| MICROSOFT CORP | 3 | 2011–2014 |
| SUN SEY-PING | 3 | 2014–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taipei, TW | 14 | 2014–2020 |
| Taoyuan, TW | 2 | 2021 |
| Hsinchu, TW | 2 | 2019 |
| Sunnyvale, California, US | 2 | 2011–2013 |
| Taichung, TW | 1 | 2020 |