Inventor
Yoshiyuki Sakai
Inventor
Nagano, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices16%
H10DInorganic electric semiconductor devices16%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
B05CApparatus for applying fluent materials to surfaces, in general7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
B29CShaping or joining of plastics5%
F26BDrying solid materials or objects by removing liquid therefrom5%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
PatentTitleYear
10,790,373Semiconductor device and method of manufacturing same202010,096,680Silicon carbide semiconductor device and method of manufacturing silicon carbide semiconductor device201810,079,298Semiconductor device and method of manufacturing semiconductor device20189,978,598Silicon carbide semiconductor device and method of manufacturing silicon carbide semiconductor device20189,923,062'Silicon carbide semiconductor device and method of manufacturing a silicon carbide semiconductor device'20189,893,162'Silicon carbide semiconductor device and method of manufacturing silicon carbide semiconductor device'20189,761,453'Method for manufacturing a silicon carbide semiconductor element'20179,296,908'Aqueous inkjet ink composition'20167,488,513'Process for producing microcapsule enclosing electrophoretic particle dispersion, microcapsule enclosing electrophoretic particle dispersion and reversible display medium containing the same'20096,641,671'Coating apparatus for applying coating material intermittently to substrate'20036,455,105'Intermittent coating system and intermittent coating method'20026,121,097'Semiconductor device manufacturing method'20005,882,407'Apparatus and method for applying a coating to a base material'19995,854,120'Semiconductor device manufacturing method'19985,755,042'Drying apparatus with swivel support structure for sheet direction changing rollers'19985,689,900'Drying apparatus and drying method'19975,576,241'Method of separating semiconductor wafer with dielectrics'19965,576,986'Memory device using micro vacuum tube'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2020Patents assigned to FUJI ELECTRIC CO LTD (11)· patent assignee history
1996–2020Based in Nagano, JP· patent location history
1997–2003Patents assigned to TOSHIBA MACHINE CO LTD (5)· patent assignee history
1997–1999Patents assigned to TOSHIBA BATTERY (3)· patent assignee history
1997–2002Based in Shizuoka, JP· patent location history
2009–2016Based in Tokyo, JP· patent location history
2016Patents assigned to KINOSHITA SACHIKO (1)· patent assignee history
2017–2018Based in Tsukuba, JP· patent location history
2018Patents assigned to AIST (1)· patent assignee history
2018Based in Matsumoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI ELECTRIC CO LTD | 11 | 1996–2020 |
| TOSHIBA MACHINE CO LTD | 5 | 1997–2003 |
| TOSHIBA BATTERY | 3 | 1997–1999 |
| AIST | 1 | 2018 |
| KINOSHITA SACHIKO | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nagano, JP | 5 | 1996–2020 |
| Matsumoto, JP | 4 | 2018 |
| Shizuoka, JP | 4 | 1997–2002 |
| Tsukuba, JP | 2 | 2017–2018 |
| Tokyo, JP | 2 | 2009–2016 |