LexDanaLexDanabeta
Inventor

Sandy M. Wen

Inventor
San Jose, CA, US

Overview

2→
Patents
2010–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1067%
H01LSemiconductor devices33%
PatentTitleYear
9,735,002'Integrated apparatus for efficient removal of halogen residues from etched substrates'20177,655,571'Integrated method and apparatus for efficient removal of halogen residues from etched substrates'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2017Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2010–2017Based in San Jose, CA, US· patent location history
2017Patents assigned to HOOGENSEN BRETT CHRISTIAN (1)· patent assignee history
2017Patents assigned to KAWAGUCHI MARK NAOSHI (1)· patent assignee history
2017Patents assigned to KIM STEVEN H (1)· patent assignee history
2017Patents assigned to LO KIN PONG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC22010–2017
HOOGENSEN BRETT CHRISTIAN12017
KAWAGUCHI MARK NAOSHI12017
KIM STEVEN H12017
LO KIN PONG12017
Locations
LocationPatentsSpan
San Jose, California, US22010–2017