Inventor

Hyun-Yong Cho

Inventor

Uiwang-si, KR

Overview

2012–2019

Patent span

Physics

Primary field (CPC G)

Patents· 20 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%

C07CAcyclic or carbocyclic compounds4%

H01LSemiconductor devices4%

B60LPropulsion of electrically-propelled vehicles2%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%

C08LCompositions of macromolecular compounds2%

C09KMaterials for miscellaneous applications, not provided for elsewhere2%

PatentTitleYear

10,343,541Apparatus and method for charging electric vehicle2019 9,487,694'Photosensitive resin composition and color filter using the same'2016 9,425,550'Lever type connector having respective fixation protrusions with different shapes'2016 9,268,221'Positive photosensitive resin composition, photosensitive resin layer prepared by using the same, and semiconductor device including the photosensitive resin layer'2016 9,256,118'Positive photosensitive resin composition'2016 9,176,381'Positive type photosensitive resin composition'2015 9,040,213'Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film'2015 9,023,559'Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film'2015 8,921,019'Positive photosensitive resin composition, and photosensitive resin layer and display device using the same'2014 8,841,064'Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film'2014 8,815,489'Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film'2014 8,785,103'Photosensitive novolac resin, positive photosensitive resin composition including same, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film'2014 8,735,029'Positive photosensitive resin composition, and display device and organic light emitting device using the same'2014 8,703,367'Positive photosensitive resin composition'2014 8,697,320'Phenol compounds and positive photosensitive resin composition including the same'2014 8,592,131'Ortho-nitrobenzyl ester compound and positive type photosensitive resin composition including the same'2013 8,568,954'Positive photosensitive resin composition'2013 8,501,375'Positive photosensitive resin composition'2013 8,420,287'Positive photosensitive resin composition'2013 8,198,002'Positive photosensitive resin composition'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2016Patents assigned to CHEIL IND INC (18)· patent assignee history

2012–2016Patents assigned to CHO HYUN-YONG (18)· patent assignee history

2012–2016Patents assigned to LEE JONG-HWA (16)· patent assignee history

2012–2016Patents assigned to JEONG JI-YOUNG (13)· patent assignee history

2012–2016Based in Uiwang-si, KR· patent location history

2013–2016Patents assigned to CHEON HWAN-SUNG (11)· patent assignee history

2016–2019Based in Seoul, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CHEIL IND INC	18	2012–2016
CHO HYUN-YONGself	18	2012–2016
LEE JONG-HWA	16	2012–2016
JEONG JI-YOUNG	13	2012–2016
CHEON HWAN-SUNG	11	2013–2016

Locations

Location	Patents	Span
Uiwang-si, KR	18	2012–2016
Seoul, KR	2	2016–2019