Inventor
Hiroyuki Mukaiyama
Inventor
Suwa, JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Cprimary
G02CSpectacles43%
G02BOptical elements, systems or apparatus21%
Y10TTechnical subjects covered by former us classification14%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
H02NElectric machines not otherwise provided for7%
H10NElectric solid-state devices not otherwise provided for7%
PatentTitleYear
7,927,687'Optical element, optical lowpass filter, and solid-state imaging device'20117,740,934'Optical low pass filter'20107,221,525'Drive apparatus, lens unit, and camera'20076,220,704'Progressive power lens'20016,199,983'Apparatus and method for manufacturing a progressive multi-focal lens'20016,019,470'Progressive multifocal lens and manufacturing method of eyeglass lens and progressive multifocal lens'20005,926,250'Multifocal lens for eyeglass and eyeglass lens'19995,745,211'Progressive power lens and eye glass lens'19985,644,374'Variable focus type eyesight correcting apparatus'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2010Patents assigned to SEIKO EPSON CORP (8)· patent assignee history
1997–2007Based in Suwa, JP· patent location history
1998–2001Based in Nagano, JP· patent location history
2010–2011Based in Minowa-machi, JP· patent location history
2011Patents assigned to EPSON TOYOCOM CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEIKO EPSON CORP | 8 | 1997–2010 |
| EPSON TOYOCOM CORP | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwa, JP | 5 | 1997–2007 |
| Minowa-machi, JP | 2 | 2010–2011 |
| Nagano, JP | 2 | 1998–2001 |