Inventor
Gerd Furter
Inventor
Ellwangen, DE
Overview
Patents· 8 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices54%
G02BOptical elements, systems or apparatus46%
PatentTitleYear
6,600,608'Catadioptric objective comprising two intermediate images'20036,590,718'Projection exposure system having a reflective reticle'20036,512,573'Projection exposure apparatus and exposure method'20035,982,558'REMA objective for microlithographic projection exposure systems'19995,880,891'High-resolution high-apertured objective'19995,742,436'Maximum aperture catadioptric reduction objective for microlithography'19985,402,267'Catadioptric reduction objective'19955,289,316'Measuring objective'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2003Patents assigned to ZEISS STIFTUNG (8)· patent assignee history
1994–2003Based in Ellwangen, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS STIFTUNG | 8 | 1994–2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ellwangen, DE | 8 | 1994–2003 |