Inventor
Donald J. Parker
Inventor
San Jose, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties44%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
G06VImage or video recognition or understanding22%
H01JElectric discharge tubes or discharge lamps11%
PatentTitleYear
6,930,309'Dual-energy electron flooding for neutralization of charged substrate'20056,731,787'System and method for determining reticle defect printability'20046,381,358'System and method for determining reticle defect printability'20026,076,465'System and method for determining reticle defect printability'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2004Patents assigned to KLA TENCOR CORP (3)· patent assignee history
2000–2005Based in San Jose, CA, US· patent location history
2005Patents assigned to KLA TENCOR TECH CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 3 | 2000–2004 |
| KLA TENCOR TECH CORP | 1 | 2005 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 4 | 2000–2005 |