Inventor

Akihiro Takayama

Inventor
Kanagawa, JP

Overview

12→
Patents
2013–2020
Patent span
Physics
Primary field (CPC G)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary
G03GElectrography47%
H05GX-ray technique16%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light11%
G21KHandling of particles or ionising radiation not otherwise provided for5%
H01LSemiconductor devices5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2020Patents assigned to RICOH CO LTD (9)· patent assignee history
2013–2018Patents assigned to KOSHIZUKA SHINNOSUKE (7)· patent assignee history
2013–2018Patents assigned to KUBO TATSUYA (7)· patent assignee history
2013–2018Patents assigned to TAKAYAMA AKIHIRO (7)· patent assignee history
2013–2018Patents assigned to TATEYAMA SUSUMU (7)· patent assignee history
2013–2020Based in Kanagawa, JP· patent location history
2019–2020Based in Oyama, JP· patent location history
2020Based in Tochigi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
RICOH CO LTD92013–2020
KOSHIZUKA SHINNOSUKE72013–2018
KUBO TATSUYA72013–2018
TAKAYAMA AKIHIROself72013–2018
TATEYAMA SUSUMU72013–2018
Locations
LocationPatentsSpan
Kanagawa, JP92013–2020
Oyama, JP22019–2020
Tochigi, JP12020