LexDanaLexDanabeta
Inventor

CHAITANYA GINDE

Inventor
US

Overview

1→
Patents
2023
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing20%
C09GPolishing compositions20%
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
11,820,918Hard abrasive particle-free polishing of hard materials2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023Patents assigned to ENTEGRIS INC (1)· patent assignee history
2023Patents assigned to UNIV FLORIDA (1)· patent assignee history
2023Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ENTEGRIS INC12023
UNIV FLORIDA12023
Locations
LocationPatentsSpan
US12023