Inventor
CHIA-JEN CHEN
Inventor
TW
Overview
Patents· 35 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices34%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
H10DInorganic electric semiconductor devices9%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
B08BCleaning in general4%
H01JElectric discharge tubes or discharge lamps4%
H05HPlasma technique3%
G01NInvestigating or analysing materials by determining their chemical or physical properties1%
G01QScanning-probe techniques or apparatus1%
PatentTitleYear
12,578,270Mask characterization methods202612,535,740Interstitial type absorber for extreme ultraviolet mask202612,393,129Method and device for cleaning substrates202512,366,798Lithography mask and methods202512,339,582Photomask including fiducial mark and method of making a photomask202512,298,673Method of manufacturing photo masks202512,265,322EUV mask blank and method of making EUV mask blank202512,243,872Semiconductor device structure and methods of forming the same202512,218,130Semiconductor structure cutting process and structures formed thereby202512,147,154EUV photo masks and manufacturing method thereof202412,130,548Extreme ultraviolet mask with reduced wafer neighboring effect202412,107,149Air spacer and method of forming same202412,085,866Particle removing assembly and method of cleaning mask for lithography202412,038,693Method of manufacturing photo masks202412,032,302Method and device for cleaning substrates202411,982,936Photomask and method of fabricating a photomask202411,899,357Lithography mask202411,860,532Photomask including fiducial mark and method of making a semiconductor device using the photomask202411,852,966Lithography mask with a black border regions and method of fabricating the same202311,855,085Semiconductor structure cutting process and structures formed thereby202311,815,804EUV mask blank and method of making EUV mask blank202311,740,547Method of manufacturing extreme ultraviolet mask with reduced wafer neighboring effect202311,698,592Particle removing assembly and method of cleaning mask for lithography202311,687,006Method of manufacturing photo masks202311,652,155Air spacer and method of forming same202311,619,875EUV photo masks and manufacturing method thereof202311,444,080Semiconductor structure cutting process and structures formed thereby202211,435,660Photomask and method of fabricating a photomask202211,430,671Ozone wafer cleaning module having an ultraviolet lamp module with rotatable reflectors202211,422,466Photomask including fiducial mark and method of making semiconductor device using the photomask202211,349,014Air spacer and method of forming same202211,327,405Method of manufacturing photo masks202211,294,292Particle removing assembly and method of cleaning mask for lithography202211,143,954Mask patterns and method of manufacture202111,137,684Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (35)· patent assignee history
2021–2026Based in TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 35 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| TW | 35 | 2021–2026 |