Inventor
HENDRIK JAN HIDDE SMILDE
Inventor
NL
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G01BMeasuring length, thickness or similar linear dimensions24%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
G06TImage data processing or generation, in general5%
H01LSemiconductor devices5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
12,429,328Metrology method, target and substrate202511,526,085Metrology method and apparatus, substrate, lithographic system and device manufacturing method202211,466,980Metrology method and apparatus, lithographic system, device manufacturing method and substrate202211,428,521Metrology method, target and substrate202211,392,043Method and metrology apparatus for determining estimated scattered radiation intensity202211,204,239Metrology method, target and substrate202111,181,828Method of determining a value of a parameter of interest of a patterning process, device manufacturing method2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (7)· patent assignee history
2021–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 7 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| NL | 7 | 2021–2025 |