Inventor

Erik Henricus Egidius Catharina Eummelen

Inventor
Eindhoven, NL

Overview

24→
Patents
2013–2021
Patent span
Physics
Primary field (CPC G)

Patents· 24 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
H01LSemiconductor devices7%
B01DSeparation3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G02BOptical elements, systems or apparatus3%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation3%
B67DDispensing, delivering or transferring liquids, not otherwise provided for2%
G06FElectric digital data processing2%
PatentTitleYear
11,048,178Lithographic apparatus with improved patterning performance202110,969,695Fluid handling structure and lithographic apparatus202110,859,919Fluid handling structure, a lithographic apparatus and a device manufacturing method202010,725,390Inspection substrate and an inspection method202010,649,341Lithographic apparatus202010,551,748Fluid handling structure, a lithographic apparatus and a device manufacturing method202010,534,270Lithography apparatus, a method of manufacturing a device and a control program202010,416,571Fluid handling structure and lithographic apparatus201910,261,422Lithography apparatus and method of manufacturing a device201910,216,100Inspection substrate and an inspection method201910,095,129Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus20189,625,828'Fluid handling structure, lithographic apparatus and device manufacturing method'20179,618,835'Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure'20179,563,132'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20179,465,302'Lithographic apparatus'20169,291,914'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20169,195,147'Lithographic apparatus and device manufacturing method involving a seal between a table and a component'20159,176,393'Lithographic apparatus and a method of operating the apparatus'20159,036,127'Lithographic apparatus'20158,836,912'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20148,599,356'Shutter member, a lithographic apparatus and device manufacturing method'20138,446,561'Lithographic apparatus and a method of measuring flow rate in a two phase flow'20138,416,388'Fluid handling device, an immersion lithographic apparatus and a device manufacturing method'20138,405,817'Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2021Patents assigned to ASML NETHERLANDS BV (24)· patent assignee history
2013–2017Patents assigned to EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA (11)· patent assignee history
2013–2017Patents assigned to BESSEMS DAVID (5)· patent assignee history
2013–2017Patents assigned to RIEPEN MICHEL (4)· patent assignee history
2013–2020Based in Eindhoven, NL· patent location history
2013–2021Based in Veldhoven, NL· patent location history
2014–2017Patents assigned to CORTIE ROGIER HENDRIKUS MAGDALENA (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV242013–2021
EUMMELEN ERIK HENRICUS EGIDIUS CATHARINAself112013–2017
BESSEMS DAVID52013–2017
RIEPEN MICHEL42013–2017
CORTIE ROGIER HENDRIKUS MAGDALENA32014–2017
Locations
LocationPatentsSpan
Eindhoven, NL182013–2020
Veldhoven, NL62013–2021