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Inventor

Katsumi Mitani

Inventor
Chiba, JP

Overview

1→
Patents
1999
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
5,953,630'Suppression of tungsten film deposition on a semiconductor wafer bevel edge with a halogenide purge gas'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
1999Based in Chiba, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC11999
Locations
LocationPatentsSpan
Chiba, JP11999