LexDanaLexDanabeta
Inventor

Fred Chen

Inventor
Hsinchu, TW

Overview

6→
Patents
2000–2006
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1043%
H01JElectric discharge tubes or discharge lamps14%
PatentTitleYear
7,014,956'Active secondary exposure mask to manufacture integrated circuits'20066,942,958'Modifying circuitry features in radiation sensitive layers with active secondary exposure masks'20056,210,843'Modulation of peripheral critical dimension on photomask with differential electron beam dose'20016,174,798'Process for forming metal interconnect stack for integrated circuit structure'20016,147,409'Modified multilayered metal line structure for use with tungsten-filled vias in integrated circuit structures'20006,087,726'Metal interconnect stack for integrated circuit structure'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2001Patents assigned to LSI LOGIC CORP (3)· patent assignee history
2000–2001Based in Hsinchu, TW· patent location history
2001–2006Patents assigned to INTEL CORP (3)· patent assignee history
2001Based in San Jose, CA, US· patent location history
2005–2006Based in Cupertino, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INTEL CORP32001–2006
LSI LOGIC CORP32000–2001
Locations
LocationPatentsSpan
Hsinchu, TW32000–2001
Cupertino, California, US22005–2006
San Jose, California, US12001